Sputtering Targets
& PVD Materials

Precision-engineered sputtering targets, arc cathodes and evaporation materials for semiconductor, optical coating, photovoltaic, automotive and advanced thin film applications.

High Purity Materials         Custom Manufacturing        Reliable Global Supply

Precision Materials. Reliable Performance.

Shanghai Huanke Nonferrous Metals Co., Ltd. provides high-quality sputtering targets, arc cathodes and evaporation materials for demanding PVD thin film applications worldwide.

Your Trusted Partner for Advanced PVD Materials

We combine material expertise, precision manufacturing and strict quality control to deliver reliable coating materials for research, development and industrial production.

    • High-purity metal, alloy and ceramic materials

    • Custom sizes, compositions and target configurations

    • Stable quality for consistent thin film deposition

    • Flexible support from prototypes to volume supply

From semiconductor and optical coatings to photovoltaic, automotive and advanced manufacturing applications, Huanke helps customers achieve stable deposition performance, improved process efficiency and dependable product quality.

PVD Materials Engineered for Performance

From high-purity metals to customized alloys and ceramic materials, Huanke provides reliable sputtering targets and coating materials for demanding thin film deposition processes.

Metal Sputtering Targets

High-purity metal targets for semiconductor, optical, decorative, hard coating and other PVD applications.

Alloy Sputtering Targets

Precisely controlled alloy compositions designed for stable deposition and consistent thin film performance.

Ceramic Sputtering Targets

High-density ceramic targets for optical, display, photovoltaic, electronic and functional coating applications.

PVD Materials We Supply

✓ Planar Sputtering Targets
✓ Rotary Sputtering Targets
✓ Arc Cathodes
✓ Evaporation Materials
✓ Target Bonding Services
✓ Custom Sputtering Targets

Arc Cathodes

High-purity metal targets for semiconductor, optical, decorative, hard coating and other PVD applications.

Evaporation Materials

Precisely controlled alloy compositions designed for stable deposition and consistent thin film performance.

Custom Sputtering Targets

High-density ceramic targets for optical, display, photovoltaic, electronic and functional coating applications.

Built for Consistent PVD Performance
From material purity to final machining, every detail is focused on reliable deposition and repeatable coating results.

Let’s Discuss Your PVD Material Requirements

“The imitation gold material has excellent color consistency and a premium finish. We’re very satisfied with the quality.”
~Michael R., Purchasing Manager

“The copper plates arrived with excellent surface quality and precise dimensions. Reliable product and professional service.”
~David M., Production Manager

“The aluminum plates are consistent, clean, and easy to process. Quality has been excellent across multiple orders.”
~James T., Operations Manager

News & Insights

Stay updated with Huanke’s latest news, technical articles and insights into PVD materials, sputtering targets and thin film applications.

Got Questions?


Need help choosing the right sputtering target or PVD material? Our team is here to support you with material selection, customization, technical requirements and quotation inquiries.

What types of sputtering targets do you supply?

We supply metal, alloy and ceramic sputtering targets, as well as arc cathodes, evaporation materials, planar targets, rotary targets and custom PVD materials.

Yes. We can customize material composition, purity, dimensions, shape, backing plate configuration and bonding requirements according to your PVD equipment and process needs.

Available purity depends on the material. We can supply different purity grades based on the application and customer requirements, including high-purity materials for semiconductor, optical and advanced thin film applications.

Please provide the material, purity, dimensions, quantity and any special requirements such as backing plates, bonding or target geometry. Application details are also helpful for recommending the right solution.

Yes. We provide sputtering target materials for semiconductor wafer processing, electronic devices and other precision thin film deposition applications.

Yes. We support customized requirements for R&D, prototype development and production applications, depending on the material and specifications.